The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 1986

Filed:

Feb. 18, 1986
Applicant:
Inventors:

Paul E Bakeman, Jr, Shelburne, VT (US);

Henry J Geipel, Jr, Essex Junction, VT (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
357 42 ; 357 12 ; 357 41 ; 357 86 ;
Abstract

A contact structure suitable for use in a CMOS device to prevent or suppress the latch-up phenomenon in the device. It uses two degeneratively doped regions of different conductivity type with a tunnel injecting interface therebetween and a conductive segment contiguous to one of the two regions. Using such a structure as the source of an FET in a CMOS arrangement causes the emitter area and the base spreading resistance of the corresponding parasitic bipolar transistor to be reduced. This in turn causes the current gain of the parasitic transistor to decrease and the latch-up phenomenon to be prevented or suppressed.


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