The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 09, 1986

Filed:

Nov. 14, 1985
Applicant:
Inventors:

Masao Sakata, Yokohama, JP;

Shigeru Kobayashi, Tokyo, JP;

Katsuo Abe, Yokosuka, JP;

Hideaki Shimamura, Yokohama, JP;

Tsuneaki Kamei, Kanagawa, JP;

Osamu Kasahara, Tokyo, JP;

Hidetsugu Ogishi, Hachioji, JP;

Takeshi Oyamada, Takasaki, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
204298 ; 20419215 ;
Abstract

A sputtering target structure suitable for use with a planar magnetron sputtering electrode device has a plurality of annular target members arranged concentrically. The annular target member is provided with either an annular groove for concentration of an electric field or an annular wall for repelling electrons.


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