The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 1986
Filed:
Apr. 24, 1984
Applicant:
Inventors:
Fumio Kataoka, Yokohama, JP;
Fusaji Shoji, Yokohama, JP;
Isao Obara, Kamakura, JP;
Issei Takemoto, Yokohama, JP;
Hitoshi Yokono, Katsuta, JP;
Tokio Isogai, Fujisawa, JP;
Mitsumasa Kojima, Hitachi, JP;
Assignees:
Hitachi, Ltd, Tokyo, JP;
Hitachi Chemical Company, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03F / ;
U.S. Cl.
CPC ...
430196 ; 430197 ; 430270 ; 430283 ; 430325 ; 430330 ; 430919 ; 430927 ; 260349 ;
Abstract
A light-sensitive polymer composition comprising a poly(amic acid), a special bisazide compound and an amine compound can give a film which has high sensitivity and in which portions exposed to light are not easily released by a developing solution at the time of development.
Kataoka, Fumio. (1986). Light-sensitive polymer composition with poly(amic acid), bisazide, and (U.S. Patent No. 4565767). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4565767
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile