The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 1985

Filed:

Mar. 09, 1984
Applicant:
Inventors:

Douglas H Warenback, San Rafael, CA (US);

Thomas M Rathmann, Rohnert Park, CA (US);

Ninko T Mirkovich, Novato, CA (US);

Assignee:

Tegal Corporation, Novato, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23F / ; B44C / ; C03C / ;
U.S. Cl.
CPC ...
156345 ; 156643 ; 156646 ; 204298 ;
Abstract

A plasma reactor of the single wafer, planar electrode type achieves improved serviceability by means of a service seal arrangement. The lower electrode of the plasma reactor is carried on a chuck. Both the chuck and the upper portions of the reactor seal to an upper plate of a vacuum containment vessel. A wafer transport mechanism is contained within the vacuum containment vessel. The sealing arrangement allows removal of the upper portions of the reactor and even replacement of the lower electrode without disturbing the vacuum in the vacuum containment vessel.


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