The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 1985
Filed:
Apr. 26, 1984
Applicant:
Inventors:
Franz Kuhn-Kuhnenfeld, Emmerting, DE;
Josef Kramler, Burgkirchen, DE;
Hans-Adolf Gerber, Burghausen, DE;
Assignee:
Wacker-Chemitronic Gesellschaft Fur Elektronik-Grundstoffe mbH, Burghausen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B23K / ;
U.S. Cl.
CPC ...
148-15 ; 29574 ; 2957 / ; 148187 ; 156644 ; 427 531 ;
Abstract
A method for producing contrast rich, permanent and slag-free characterizations, particularly on polished semiconductor disks is described, in which the surface for generating the surface pattern is partially melted by laser radiation. According to the invention, a surface segment corresponding to 1.5 to 6.5 times the surface area of the desired surface pattern is irradiated, and the semiconductor material is caused to melt and partially vaporize only in the center thereof.