The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 1984
Filed:
Jan. 03, 1983
Applicant:
Inventors:
A Stuart Denholm, Lincoln, MA (US);
William A Frutiger, Beverly, MA (US);
Kenneth E Williams, Andover, MA (US);
Assignee:
Sony Corporation, Tokyo, JP;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504922 ; 250400 ; 2191 / ; 2191 / ;
Abstract
This disclosure is concerned with the use of fine line converged electron beams of high aspect ratio for effecting physical, chemical, mechanical and other changes in the surface of objects, and also volume effects, including applications, for example, to semiconductor and other materials surface modification technology, annealing, welding, etching, polishing, cutting, curing and other surface and volume alteration.