The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 1984
Filed:
Mar. 20, 1981
Applicant:
Inventor:
Jacques Weinstock, Flushing, NY (US);
Assignee:
UPA Technology, Inc., Syosset, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ; G01D / ;
U.S. Cl.
CPC ...
250308 ; 2502521 ; 2503581 ;
Abstract
An aperture piece to be used in conjunction with backscatter instruments for measuring the thickness of a coating on a substrate of a concave workpiece. The aperture piece being selectively shaped so that a sample support surface, including an aperture through which radiation from a radioisotope is transmitted, may be inserted into the interior space defined by the concave workpiece to engage the concave surface. A method of calibrating backscatter instruments using the aperture piece to make correction for the failure to have a planar mating relation between the sample support surface and the concave workpiece.