The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 06, 1982
Filed:
Apr. 24, 1980
Applicant:
Inventors:
Arthur R Calawa, Chelmsford, MA (US);
Joseph V Gormley, Merrimack, NH (US);
Michael J Manfra, Tewksbury, MA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156636 ; 156345 ; 156662 ; 252 791 ;
Abstract
A method and apparatus for polishing surfaces so as to provide surfaces which are optically flat and damage free. An etch solution is applied to a rotating surface and the surface to be prepared is caused by hydroplane on the etch solution, the hydroplaning action producing the desired optically flat surface.