The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 1981
Filed:
May. 02, 1980
Applicant:
Inventor:
Vincent J Coates, Palo Alto, CA (US);
Assignee:
Nanometrics, Incorporated, Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
364525 ; 364491 ; 364571 ; 356357 ;
Abstract
A method for determining the precise exposure for a photoresist coating by measuring the coating thickness with a microspectrophotometer that provides data for plotting a nearly sinusoidal curve of percent reflectivity versus wavelength. The nominal exposure derived from the thickness measurement is then corrected to a precise value by extrapolation and normalization of the curve at the photosensitive wavelength of the photoresist.
Coates, Vincent. (1981). Method for the precise determination of photoresist exposure time (U.S. Patent No. 4308586). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4308586
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile