The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 1981
Filed:
Mar. 16, 1979
Applicant:
Inventors:
Minoru Tsuda, Isehara, JP;
Yoichi Nakamura, Samukawa, JP;
Hideo Nagata, Samukawa, JP;
Hisashi Nakane, Kawasaki, JP;
Assignee:
Tokyo Ohka Kogyo Kabushiki Kaisha, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; C08F / ;
U.S. Cl.
CPC ...
430270 ; 20415914 ; 20415922 ; 430311 ; 430322 ; 430918 ; 526316 ;
Abstract
A sensitive composition comprising polymethyl isopropenyl ketone of limited molecular weight and a compound of a given general formula. The formation of a pattern of less than 1 .mu.m is made possible by employing ultraviolet rays of wave lengths of 100-350 nm in place of those of 350-450 nm utilized in conventional processes. The sensitive composition is highly sensitive to ultraviolet rays in said wave range and reproduces a fine pattern precisely.