The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 1980
Filed:
Apr. 24, 1978
Applicant:
Inventors:
Thomas N Fogarty, Allentown, PA (US);
William R Harshbarger, Bethlehem, PA (US);
Roy A Porter, Whitehall, PA (US);
Assignee:
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156657 ; 156662 ; 2041 / ; 427 38 ; 427 88 ; 427 94 ; 427 95 ;
Abstract
A method of forming patterned insulating layers such as silicon nitride for use in integrated circuit fabrication is disclosed. The insulating layer is formed by reactive plasma deposition while the temperature of the substrate is decreased. This diminishing temperature affects the etching characteristics of the layer such that when openings are formed by a selective plasma etching, the sidewalls will be sloped at an acute angle with the substrate even when the layer is overetched.