The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 1979
Filed:
Mar. 27, 1978
Sheau-Ming S Liu, Sunnyvale, CA (US);
William H Owen, III, Mountain View, CA (US);
Richard D Pashley, Sunnyvale, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A process for forming an electrical contact region between layers of polysilicon with an integral polysilicon resistor during the fabrication of MOS integrated circuits is disclosed. The contact region which does not require critical alignments, may be formed directly over an active channel or buried (substrate) contact. A silicon nitride mask is formed at the location of the contact region on the first polysilicon layer thereby allowing a thick oxide to be grown on the remainder of the substrate. After removal of the silicon nitride mask, a second polysilicon layer is formed which contacts the first layer at the contact region and defines the resistor. A doping step is used to establish the resistance of the resistor. The process permits the fabrication, by way of example, of a static (bistable) MOS memory cell employing polysilicon loads with an area of approximately 1.5 mils.sup.2.