The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 1977
Filed:
Jan. 22, 1976
Frank Bernard Alexander, Jr, Paterson, NJ (US);
Cesar Deduyo Capio, Fords, NJ (US);
Victor Emerald Hauser, Jr, Palmerton, PA (US);
Hyman Joseph Levinstein, Berkeley Heights, NJ (US);
Cyril Joseph Mogab, Murray Hill, NJ (US);
Ashok Kumar Sinha, Murray Hill, NJ (US);
Richard Siegfried Wagner, Bernardsville, NJ (US);
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ (US);
Abstract
An improved radio frequency (rf) powered radial flow cylindrical reactor utilizes a gas shield which substantially limits the glow plasma discharge reaction to a section of the reactor over the semiconductor substrates which are to be coated. The gas shield permits the use of higher rf input power which contributes to the formation of protective films that have desirable physical and electrical characteristics.