Method of making memory cells, transistor devices and logic devices on silicon-on-insulator substrate

Abstract

A method of forming a semiconductor device by providing a substrate having bulk silicon, an insulation layer over the bulk silicon, and a silicon layer over the insulation layer. The silicon and insulation layers are removed from first and second areas, while maintained in a third area. A memory cell is formed in the first area having a floating gate over a first portion of a memory cell channel region and a control gate over a second portion of the memory cell channel region. A transistor device is formed in the second area having a transistor gate over a transistor channel region. A logic device is formed in the third area having a logic device gate over a logic device channel region. The memory cell channel region and the transistor channel region are disposed in the bulk silicon. The logic device channel region is disposed in the silicon layer.