The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Feb. 29, 2024
Tokyo Electron Limited, Tokyo, JP;
International Business Machines Corporation, Armonk, NY (US);
Devi Koty, Hopewell Junction, NY (US);
Qingyun Yang, Hopewell Junction, NY (US);
Nathan P. Marchack, New York, NY (US);
Tokyo Electron Limited, Tokyo, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A semiconductor substrate can be loaded into a plasma chamber, the semiconductor substrate having a through opening within a mask layer disposed over the semiconductor substrate. Using a plasma process, a through substrate via can be formed within the semiconductor substrate. The through substrate via can have a circular shape or an annulus shape with an inner semiconductor core. The plasma process can include exposing the through opening to a plasma chemistry formed from a gas mixture comprising boron, chlorine, fluorine, carbon, and sulfur.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile