The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2026
Filed:
Mar. 15, 2024
Tokyo Electron Limited, Tokyo, JP;
Megan Carruth, Austin, TX (US);
Zhiying Chen, Austin, TX (US);
Michael Hummel, Austin, TX (US);
Joel Blakeney, Austin, TX (US);
Shyam Sridhar, Austin, TX (US);
Peter Lowell George Ventzek, Austin, TX (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
An ion angle detector includes a front plate that includes an aperture configured to form an ion beam from incident ions. An ion collector of the detector is configured to measure ion flux from the ion beam. A linear actuator is mechanically coupled to the ion collector and configured to move the ion collector in a direction parallel to the ion beam. Ion angular distribution of a plasma may be measured using the detector by moving the ion collector parallel to the ion beam, measuring ion flux while moving the ion collector to obtain the flux as a function of distance from the source location, and obtaining the angular distribution from the flux and the distance. The ion angle detector may be disposed in a chamber of a plasma system that has a controller operatively coupled to the detector and configured to measure ion angular distribution.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile