The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 03, 2026

Filed:

Jan. 16, 2025
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Hyungjin Kim, Suwon-si, KR;

Hojun Lee, Suwon-si, KR;

Daehoon Han, Suwon-si, KR;

Jangwoon Sung, Suwon-si, KR;

Jongsu Kim, Suwon-si, KR;

Narae Bae, Suwon-si, KR;

Sangwoo Bae, Suwon-si, KR;

Minhwan Seo, Suwon-si, KR;

Kyungjun Yeo, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2022.01); G01B 9/02001 (2022.01); G01B 11/06 (2006.01);
U.S. Cl.
CPC ...
G01B 9/02087 (2013.01); G01B 9/02007 (2013.01); G01B 9/02011 (2013.01); G01B 9/02084 (2013.01); G01B 11/0608 (2013.01); G01B 2290/70 (2013.01);
Abstract

A semiconductor measuring device includes a first light source configured to output first light having a first wavelength, a second light source configured to output second light having a second wavelength, different from the first wavelength, a first beam splitter configured to generate first combined light and second combined light, each comprising the first light and the second light, a beam displacer configured to separate the first combined light into the first light and the second light, a camera configured to obtain a first interference pattern and a second interference pattern, the first interference pattern being based on the first light and a reflected light of the second combined light reflected from a first surface of a measurement object, and a computing device configured to compute first height information of a first point included in the first surface based on the first interference pattern and the second interference pattern.


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Kim, Hyungjin. (2026). Semiconductor measuring device using beam displacer (U.S. Patent No. 12782110). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12782110

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