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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12781333 B1

PDFFull Text
Date of Patent:
Nov. 03, 2026

Filed:

Jul. 19, 2019

Coating for performance enhancement of semiconductor apparatus

Applicant:

Advanced Micro-fabrication Equipment Inc. China, Shanghai, CN;

Inventors:

Xiaoming He, Shanghai, CN;

Li Zhang, Shanghai, CN;

Xingjian Chen, Shanghai, CN;

Tuqiang Ni, Shanghai, CN;

Zhaoyang Xu, Shanghai, CN;

Assignee:

ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA, Shanghai, CN;

Attorney:

Womble Bond Dickinson (US) LLP

Primary Examiner:

David P Turocy

Int. Cl.
CPC ...
C23C 14/22 (2006.01); C23C 14/02 (2006.01); C23C 14/06 (2006.01); C23C 14/08 (2006.01); C23C 14/32 (2006.01); C23C 14/34 (2006.01); C23C 14/58 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 14/028 (2013.01); C23C 14/06 (2013.01); C23C 14/0694 (2013.01); C23C 14/083 (2013.01); C23C 14/22 (2013.01); C23C 14/32 (2013.01); C23C 14/34 (2013.01); C23C 14/5873 (2013.01); H01J 37/32477 (2013.01); H01J 37/32495 (2013.01); H01J 37/32559 (2013.01); H01J 37/32623 (2013.01); H01J 37/32642 (2013.01); Y10T 29/49888 (2015.01);
Abstract

A plasma processing chamber having advanced coating for the showerhead and for an extended bottom electrode. The extended bottom electrode can be formed by one or more of the focus ring, cover ring, and plasma confinement ring. The extended electrode can be formed using a one-piece composite cover ring. The composite cover ring may be made of AlOand include a YOplasma resistant coating. The plasma confinement ring may include a flow equalization ion shield that may also be provided with the plasma resistant coating. The plasma resistant coating of the extended electrode may have elements matching that of the showerhead.

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He, Xiaoming. (2026). Coating for performance enhancement of semiconductor apparatus (U.S. Patent No. 12781333). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12781333

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