The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2026

Filed:

Apr. 15, 2024
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Ru-Shang Hsiao, Hsinchu County, TW;

Chun Hsiung Tsai, Hsinchu County, TW;

Clement Hsingjen Wann, Carmel, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 70/00 (2026.01); B08B 3/08 (2006.01); H10P 50/28 (2026.01); H10W 20/00 (2026.01); H10W 20/20 (2026.01);
U.S. Cl.
CPC ...
H10P 70/277 (2026.01); B08B 3/08 (2013.01); H10P 50/283 (2026.01); H10W 20/033 (2026.01); H10W 20/056 (2026.01); H10W 20/062 (2026.01); H10W 20/066 (2026.01); H10W 20/0698 (2026.01); H10W 20/083 (2026.01); H10W 20/20 (2026.01);
Abstract

A semiconductor structure includes a substrate, a conductive feature over the substrate, a dielectric layer over the conductive feature and the substrate, and a structure disposed over and electrically connected to the conductive feature. The structure is partially surrounded by the dielectric layer and includes a first metal-containing layer and a second metal-contain layer surrounded by the first metal-containing layer. The first and the second metal-containing layers include different materials. A lower portion of the first metal-containing layer includes a transition metal or a transition metal nitride and an upper portion of the first metal-containing layer includes a transition metal fluoride or a transition metal chloride.


Find Patent Forward Citations

Hsiao, Ru-Shang. (2026). Method and structure for semiconductor interconnect (U.S. Patent No. 12777872). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12777872

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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