The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

Nov. 10, 2022
Applicant:

Lam Research Corporation, Fremont, CA (US);

Inventors:

Liwei An, Tigard, OR (US);

Ramesh Chandrasekharan, Lake Oswego, OR (US);

Sergey Georgiyevich Belostotskiy, Sherwood, OR (US);

Tu Hong, Tualatin, OR (US);

Chunhai Ji, Portland, OR (US);

Noah Elliot Baker, West Linn, OR (US);

Assignee:

LAM RESEARCH CORPORATION, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10P 72/72 (2026.01); H01J 37/32 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
H10P 72/722 (2026.01); H01J 37/32935 (2013.01); H10P 72/0616 (2026.01);
Abstract

A system for monitoring health of a pedestal of a processing chamber comprises a memory storing instructions and a processor. The processor is configured to execute the instructions to sense one or more currents through one or more electrodes arranged in the pedestal; generate one or more metrics based on the one or more currents; and determine a health of the pedestal based on the one or more metrics.


Find Patent Forward Citations

An, Liwei. (2026). System for monitoring performance of electrostatic chucks in substrate processing systems (U.S. Patent No. 12772792). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12772792

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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