The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2026

Filed:

May. 13, 2024
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Chang Seok Kang, Santa Clara, CA (US);

Raghuveer Satya Makala, Campbell, CA (US);

Fredrick Fishburn, Belmont, CA (US);

Hsueh Chung Chen, Cohoes, NY (US);

Balasubramanian Pranatharthiharan, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 12/00 (2023.01); H10B 80/00 (2023.01);
U.S. Cl.
CPC ...
H10B 12/482 (2023.02); H10B 12/02 (2023.02); H10B 80/00 (2023.02);
Abstract

Exemplary methods of manufacturing 2D DRAM and 3D DRAM devices include etching a portion of a low-k spacer material from a substrate. The methods may include exposing the remaining portion of the low-k spacer material of a 2D DRAM bit line to a carbon-containing precursor, to replenish the carbon content in the low-k spacer material. Additional methods may include exposing the remaining portion of the low-k spacer material of a 3D DRAM word line to a carbon-containing precursor to replenish the carbon content in the low-k spacer material. Further embodiments may include simultaneous treatment with ultraviolet (UV) radiation.


Find Patent Forward Citations

Kang, Chang. (2026). Method and structure of low-k spacer using post-treatment for memory applications (U.S. Patent No. 12772440). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12772440

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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