The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Aug. 03, 2023
Yangtze Memory Technologies Co., Ltd., Wuhan, CN;
Abstract
The present disclosure relates to a semiconductor apparatus, a fabrication method thereof, and a memory system. In the present disclosure, different semiconductor devices (e.g., a high-voltage device and a low-voltage device) of a semiconductor apparatus are provided with gate spacers of different thicknesses by two dielectric deposition operations. Due to the use of the two dielectric deposition operations, the present disclosure can both provide a high-voltage device with a gate spacer having a relatively larger thickness and provide a low-voltage device with a gate spacer having a relatively smaller thickness, such as a thin gate spacer having a thickness less than 8 nm.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile