The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
Aug. 22, 2023
Fei Company, Hillsboro, OR (US);
Stefano Vespucci, Eindhoven, NL;
Luigi Mele, Eindhoven, NL;
Wouter René J. Van Den Broek, Eindhoven, NL;
Ivan Lazić, Eindhoven, NL;
Abstract
Systems, components, and methods for generating differential phase contrast (DPC) data are described. Methods include operations for directing the beam of electrons through a material sample disposed in the microscope column, wherein interactions of the material sample and the beam of electrons produce a scattered portion of the beam of electrons. The methods include directing the scattered portion onto the energy filter, the energy filter being configured to disperse the scattered portion along a dispersal axis by energy and to direct a subset of the scattered portion toward a detector of the energy filter. The operations include generating detector data using the subset of the scattered portion incident on the detector, the detector data comprising EELS data. The operations also include generating differential phase contrast data using the detector data.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile