The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
May. 20, 2024
Samsung Electronics Co., Ltd., Suwon-si, KR;
Postech Research and Business Development Foundation, Pohang-si, KR;
Seung-Hwan Baek, Pohang-si, KR;
Seokjun Choi, Pohang-si, KR;
Seungwoo Yoon, Pohang-si, KR;
Seungyong Lee, Pohang-si, KR;
Jinwoo Park, Pohang-si, KR;
Nahyup Kang, Suwon-si, KR;
Jiyeon Kim, Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
POSTECH RESEARCH AND BUSINESS DEVELOPMENT FOUNDATION, Pohang-si, KR;
Abstract
A method of determining an illumination pattern includes constructing a dataset by estimating a first surface normal vector of a three-dimensional (3D) object from a first image obtained by capturing the 3D object of which surface normal information is known, the dataset including basis images of the 3D object; generating simulation images in which virtual illumination patterns, obtained based on a combination of the basis images, are applied to the 3D object; estimating a second surface normal vector of the 3D object, by reconstructing a surface normal using a photometric stereo technique based on the virtual illumination patterns and simulation images corresponding to the virtual illumination patterns; and training a neural network to determine an illumination pattern based on a difference between the first surface normal vector and the second surface normal vector.
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