The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2026
Filed:
May. 22, 2023
Samsung Sdi Co., Ltd., Yongin-si, KR;
Ryunmin Heo, Suwon-si, KR;
Jin-Hee Bae, Suwon-si, KR;
Hyungrang Moon, Suwon-si, KR;
Taeksoo Kwak, Suwon-si, KR;
Gyeong Ryeong Bak, Suwon-si, KR;
Chungheon Lee, Suwon-si, KR;
Byeonggyu Hwang, Suwon-si, KR;
Samsung SDI Co., Ltd., Yongin-si, KR;
Abstract
A metal-containing photoresist developer composition includes an organic solvent, and at least one additive selected from a phosphorous acid-based compound, a hypophosphorous acid-based compound, a sulfurous acid-based compound, and a hydroxamic acid-based compound, wherein the additive is included in an amount of about 0.0001 wt % to less than about 1.0 wt %. A method of forming patterns includes step of developing a metal-containing photoresist film using the metal-containing photoresist developer composition.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile