The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2026

Filed:

Jun. 06, 2023
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Kuo-Chiang Tsai, Hsinchu, TW;

Jeng-Ya Yeh, New Taipei, TW;

Mu-Chi Chiang, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/62 (2025.01); H10D 84/01 (2026.01); H10D 84/03 (2025.01); H10D 84/85 (2025.01);
U.S. Cl.
CPC ...
H10D 30/6219 (2025.01); H10D 84/0186 (2025.01); H10D 84/0193 (2025.01); H10D 84/038 (2025.01); H10D 84/853 (2025.01);
Abstract

Embodiments of the present disclosure relates to a semiconductor device structure. The structure includes a first source/drain feature, a first interlayer dielectric (ILD) disposed over the first source/drain feature, a first conductive feature extending through the first ILD and in electrical contact with the first source/drain feature, and a gate electrode layer extending through the first ILD and disposed adjacent the first conductive feature, wherein a top surface of the first conductive feature and a top surface of the gate electrode layer are substantially co-planar.


Find Patent Forward Citations

Tsai, Kuo-Chiang. (2026). Semiconductor device structure with butted-contact and methods of forming the same (U.S. Patent No. 12757433). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12757433

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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