The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Aug. 08, 2023
Tokyo Electron Limited, Tokyo, JP;
Hitoshi Kato, Iwate, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A substrate processing apparatus for performing a substrate processing on a substrate, includes a processing chamber having an internal space to accommodate the substrate, a substrate holder that holds the substrate in the internal space and rotates the substrate, a first nozzle mechanism swingable in the internal space and discharging a first processing gas to the substrate held by the substrate holder when the first nozzle mechanism swings, a second nozzle mechanism swingable in the internal space, separately from the first nozzle mechanism, and discharging a second processing gas to the substrate held by the substrate holder when the second nozzle mechanism swings, and a controller that controls the substrate holder and the first and second nozzle mechanisms. The controller, during the substrate processing, causes the first and second nozzle mechanisms to swing independently of each other in a state where the substrate is rotated by the substrate holder.