The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2026
Filed:
Mar. 13, 2024
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Yi-Chieh Hsieh, Hsinchu, TW;
Ming-Hsiang Cheng, Hsinchu, TW;
Ting-Kui Chang, Hsinchu, TW;
William Weilun Hong, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Abstract
An inline CMP slurry mixing system includes a mixing device having a container and a blender, a removal rate sensor disposed adjacent to a CMP platen, a signal processor, and a process controller. The container is in fluid connection to a base slurry supply and additive supplies. The blender mixes a base slurry and multiple additives into a slurry mixture to be dispensed to the CMP platen. The removal rate sensor detects an instant removal rate of the CMP platen on a substrate. The signal processor compares the instant removal rate with a reference removal rate, and then determines whether to adjust one or more of flow rates of the base slurry and the additives based on the comparing. The process controller adjusts one or more of the flow rates of the base slurry and the additives based on the determining by the signal processor.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile