The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2026

Filed:

Sep. 28, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

John Soo Kim, Suwon-si, KR;

Gwan Ho Kim, Suwon-si, KR;

Ji Yoon Kim, Suwon-si, KR;

Heung Sik Park, Suwon-si, KR;

Keun Hee Bai, Suwon-si, KR;

Jong Min Baek, Suwon-si, KR;

Do Haing Lee, Suwon-si, KR;

Jong Sun Lee, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10P 14/61 (2026.01); H10P 14/60 (2026.01); H10P 50/24 (2026.01); H10P 76/20 (2026.01); H10P 76/40 (2026.01); H10W 20/00 (2026.01);
U.S. Cl.
CPC ...
H10P 14/61 (2026.01); H10P 14/6339 (2026.01); H10P 50/242 (2026.01); H10P 76/20 (2026.01); H10P 76/405 (2026.01); H10P 76/4085 (2026.01); H10W 20/076 (2026.01);
Abstract

A for fabricating a semiconductor device comprises forming a mask layer on a substrate, the mask layer defining a through hole that exposes an upper surface of the substrate, the mask layer comprising a first mask layer and a second mask layer, wherein the second mask layer is between the substrate and the first mask layer, and wherein the second mask layer comprises carbon. The method includes forming a liner layer on side walls of the through hole inside the second mask layer.


Find Patent Forward Citations

Kim, John. (2026). Method for fabricating semiconductor device (U.S. Patent No. 12751222). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12751222

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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