The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2026
Filed:
Jul. 15, 2022
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Benoit Herve Gaury, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G01R 27/26 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G01R 27/2605 (2013.01); G03F 7/70655 (2023.05); G03F 7/706837 (2023.05); G03F 7/706847 (2023.05); H01J 37/28 (2013.01);
Abstract
A method of determining an overlay measurement of a substrate includes: injecting charge into a charge injection element of the substrate; determining a first capacitance of a first pair of elements and a second capacitance of a second pair of elements; and determining a capacitance ratio based on the first capacitance and the second capacitance. The overlay measurement may be determined based on the capacitance ratio, which may indicate an imbalance.