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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12747492 B1

PDFFull Text
Date of Patent:
Sep. 29, 2026

Filed:

May. 31, 2023

Physical vapor deposition system and methods of operating the same

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chia-Hsi Wang, Hsinchu City, TW;

Yen-Yu Chen, Hsinchu City, TW;

Assignee:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Attorney:

Foley & Lardner LLP

Primary Examiner:

Jaehwan Oh

Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/54 (2006.01); C23C 14/58 (2006.01); H01J 37/34 (2006.01); H10P 14/44 (2026.01); H10P 52/40 (2026.01);
U.S. Cl.
CPC ...
C23C 14/3492 (2013.01); C23C 14/54 (2013.01); C23C 14/588 (2013.01); H01J 37/3435 (2013.01); H10P 14/44 (2026.01); H10P 52/403 (2026.01); H01J 2237/24585 (2013.01); H01J 2237/332 (2013.01);
Abstract

A method for fabricating semiconductor devices is disclosed. The method includes introducing a target in a chamber of a physical vapor deposition (PVD) system. The method includes depositing, on a substrate, a first portion of a film based on a first compensation function, a first value of the first compensation function being determined according to a lifetime of the target. The method includes depositing, on the first portion of the film, a second portion of the film based on a second compensation function, a second value of the second compensation function being determined according to the lifetime of the target. The first value is different from the second value.

Find Patent Forward Citations

Wang, Chia-Hsi. (2026). Physical vapor deposition system and methods of operating the same (U.S. Patent No. 12747492). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12747492

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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