The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2026

Filed:

Dec. 23, 2021
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Clifford Ong, Portland, OR (US);

Leonard Guler, Hillsboro, OR (US);

Smita Shridharan, Hillsboro, OR (US);

Zheng Guo, Hillsboro, OR (US);

Eric Karl, Portland, OR (US);

Tahir Ghani, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 62/10 (2025.01);
U.S. Cl.
CPC ...
H10D 62/121 (2025.01);
Abstract

Integrated circuit (IC) static random-access memory (SRAM) comprising colinear pass-gate transistors and pull-down transistors having different nanoribbon widths. A narrower ribbon width within the pass-gate transistor, relative to the pull-down transistor, may reduce read instability of a bit-cell, and/or reduce overhead associated with read assist circuitry coupled to the bit-cell. In some examples, a transition between narrower and width ribbon widths is symmetrical about a centerline shared by ribbons of both the access and pull-down transistors. In some examples, the ribbon width transition is positioned within an impurity-doped semiconductor region shared by the access and pull-down transistors and may be located under a terminal contact metallization. In some examples, the impurity-doped semiconductor regions surrounding the ribbons of differing width also have differing widths.


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