The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2026

Filed:

Feb. 09, 2024
Applicant:

Kla Corporation, Milpitas, CA (US);

Inventor:

Hucheng Lee, Cupertino, CA (US);

Assignee:

KLA Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 5/40 (2006.01); G06T 5/50 (2006.01); G06T 7/00 (2017.01); G06T 7/254 (2017.01); G06V 10/75 (2022.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 5/40 (2013.01); G06T 5/50 (2013.01); G06V 10/758 (2022.01); G06T 2207/20224 (2013.01);
Abstract

Methods and systems for detecting defects on a specimen are provided. One method includes generating one or more statistics for each of multiple tiles in difference image frames generated for a job of the images. The method also includes identifying outlier tiles in the multiple tiles based on the statistic(s) generated for each of the multiple tiles. The method further includes determining one or more defect detection parameters of a defect detection method for each of the difference image frames based on the identified outlier tiles and detecting defects on the specimen with the determined defect detection parameter(s). The embodiments described herein are particularly suitable for identifying large defects, grossly defective image frames, and image misalignment in difference image generation that can be missed by currently used inspection methods and systems.


Find Patent Forward Citations

Loading…