The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2026

Filed:

Feb. 28, 2023
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Waheb Bishara, San Mateo, CA (US);

Subhasish Bandyopadhyay, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G03F 7/70516 (2013.01);
Abstract

An electronic device manufacturing system configured to identify, by a processor, a first machine-learning model trained to generate predictive data for a first process chamber and obtain metrology data associated with a substrate produced by a second process chamber. The manufacturing system is further configured to train a second machine-learning model based on the first machine-learning model and the metrology data, wherein the second machine-learning model is trained to generate predictive data associated with the second process chamber.


Find Patent Forward Citations

Bishara, Waheb. (2026). Methods and mechanisms for modifying machine-learning models for new semiconductor processing equipment (U.S. Patent No. 12743024). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12743024

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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