The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Dec. 23, 2024
Kla Corporation, Milpitas, CA (US);
Alex Watras, Mountain View, CA (US);
Hawren Fang, San Jose, CA (US);
Huan Jin, Dublin, CA (US);
Mohammadreza Ravanfar, San Jose, CA (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A method for defect detection includes receiving an optical image of a sample and dividing the received optical image include a plurality of image patches. The method includes generating a masked optical image by selectively masking the image patches based on characterization data. The method includes providing the masked optical image to a first encoder. The method includes receiving a design image and providing it to a second encoder. The method includes generating a first set of feature vectors using the first encoder and generating a second set of feature vectors using the second encoder. The method includes concatenating the feature vectors from the first encoder and the feature vectors from the second encoder and generating a reference image of the sample based on the concatenated feature vectors using a decoder, where the generated reference image is a reconstructed image of the optical image and the design image.