The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2026
Filed:
Feb. 21, 2024
Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD., Hsinchu, TW;
Abstract
A slurry monitoring device, a CMP system and a method of in-line monitoring a slurry are provided. The slurry monitoring device incudes a slurry metrology cell, a plurality of light sources, at least one optical lens, and at least one optical detector. The slurry metrology cell accommodates a slurry. The light sources emit light beams on the slurry in the slurry metrology cell. The at least one optical lens is disposed between the plurality of light sources and the slurry metrology cell. The at least one optical lens modifies a size of a light spot of the light beams impinged on the slurry. The at least one optical detector detects an intensity of the light beams scattered by abrasive particles in the slurry.