The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 01, 2026

Filed:

Sep. 23, 2022
Applicant:

Vanguard International Semiconductor Corporation, Hsinchu, TW;

Inventors:

Chrong-Jung Lin, Hsinchu, TW;

Chia-Shen Liu, Hsinchu, TW;

Wen-Hua Wen, Taoyuan, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10P 90/00 (2026.01); H10D 86/00 (2025.01); H10P 30/20 (2026.01); H10P 30/22 (2026.01); H10P 50/24 (2026.01); H10W 10/00 (2026.01); H10W 10/10 (2026.01); H10W 10/17 (2026.01);
U.S. Cl.
CPC ...
H10P 90/1906 (2026.01); H10D 86/201 (2025.01); H10P 30/204 (2026.01); H10P 30/22 (2026.01); H10W 10/014 (2026.01); H10W 10/061 (2026.01); H10W 10/17 (2026.01); H10W 10/181 (2026.01); H10P 30/21 (2026.01); H10P 50/242 (2026.01);
Abstract

A semiconductor device includes an insulating base layer, a semiconductor layer, an insulating layer, an isolation trench and a gettering site. The semiconductor layer and the insulating layer are disposed on the insulating base layer in sequence, and the isolation trench is disposed in the semiconductor layer and passes through the insulating layer. The isolation trench includes a first cross-section, a second cross-section and a third cross-section from top to bottom. The first cross-section is higher than the bottom surface of the insulating layer, and the second cross-section and the third cross-section are lower than the bottom surface of the insulating layer. The gettering site is disposed in the semiconductor layer and in contact with the isolation trench, and the vertex of the gettering site is lower than the second cross-section.


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