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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12724220 B1

PDFFull Text
Date of Patent:
Sep. 01, 2026

Filed:

Dec. 06, 2023

Adjustment method and adjustment apparatus for mutual parallelism of two back-to-back gratings

Applicant:

Shanghai Institute of Measurement and Testing Technology, Shanghai, CN;

Inventors:

Lihua Lei, Shanghai, CN;

Lijie Liang, Shanghai, CN;

Yujie Zhang, Shanghai, CN;

Yuqing Guan, Shanghai, CN;

Yaoqiong Shen, Shanghai, CN;

Liqin Liu, Shanghai, CN;

Wenzhe Zou, Shanghai, CN;

Chuangwei Guo, Shanghai, CN;

Yunxia Fu, Shanghai, CN;

Assignee:

Shanghai Institute of Measurement and Testing Technology, Shanghai, CN;

Attorney:

Robinson & Cole LLP

Primary Examiner:

Robert E Tallman

Int. Cl.
CPC ...
G02B 7/00 (2021.01); G02B 5/18 (2006.01); G02B 27/44 (2006.01);
U.S. Cl.
CPC ...
G02B 7/003 (2013.01); G02B 5/1861 (2013.01); G02B 27/44 (2013.01);
Abstract

The application provides an adjustment method and an adjustment apparatus for mutual parallelism of two back-to-back gratings, including parallelism adjustment of grating surfaces of the two gratings and parallelism adjustment of grating lines of the two gratings. Wherein a first grating and a second grating respectively disposed on both sides of the grating mounting plate are adjusted to be perpendicular to the same horizontal collimated light source respectively, so as to achieve the parallelism adjustment of the grating surfaces of the two gratings; light is emitted by a red light source, diffraction patterns formed by two gratings are displayed on a screen, more diffraction light spots are marked respectively, then marks are connected, and a mark connecting line of the first grating is adjusted to be parallel to a mark connecting line of the second grating, thereby completing the parallelism adjustment of the grating lines of the two gratings.

Find Patent Forward Citations

Lei, Lihua. (2026). Adjustment method and adjustment apparatus for mutual parallelism of two back-to-back gratings (U.S. Patent No. 12724220). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12724220

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