The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2026
Filed:
Nov. 26, 2024
United Microelectronics Corp., Hsinchu, TW;
Yi Lin Tsai, Tainan City, TW;
Chih-Hsien Tang, Taipei City, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A patterning method including the following steps is provided. A first template including at least one first main pattern, first dummy patterns, and second main patterns is provided. The first dummy patterns are located aside the first main pattern. A density of the first main pattern is less than a density of the second main patterns. A first imprint material is provided on a first substrate. The first imprint material is imprinted by using the first template to form a first imprint layer. The first substrate is etched by using the first imprint layer as a mask to form a second template. A second imprint material is provided on a material layer. The second imprint material is imprinted by using the second template to form a second imprint layer. The material layer is etched by using the second imprint layer as a mask to form a patterned material layer.