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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12707940 B1

PDFFull Text
Date of Patent:
Aug. 11, 2026

Filed:

Feb. 11, 2022

Defect inspection system employing an image enhancing model and a defect detection model, and method of using the same

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Chih-Kai Yang, Taipei, TW;

Tung-Chin Wu, Hsinchu, TW;

Yu-Tien Shen, Tainan, TW;

Hsiang Ming Chang, Hsinchu, TW;

Chun-Yen Chang, Hsinchu, TW;

Ya Hui Chang, Hsinchu, TW;

Zengqin Zhao, Zhubei, TW;

Assignee:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Attorney:

Slater Matsil, LLP

Primary Examiner:

Hwa Andrew Lee

Int. Cl.
CPC ...
H10P 74/20 (2026.01); G01N 21/95 (2006.01); G06T 1/00 (2006.01); G06T 7/00 (2017.01); H10P 14/61 (2026.01); G01N 21/88 (2006.01);
U.S. Cl.
CPC ...
H10P 74/203 (2026.01); G01N 21/9501 (2013.01); G06T 1/0007 (2013.01); G06T 7/0006 (2013.01); H10P 14/61 (2026.01); G01N 2021/8887 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A method includes patterning a hard mask over a target layer, capturing a low resolution image of the hard mask, and enhancing the low resolution image of the hard mask with a first machine learning model to produce an enhanced image of the hard mask. The method further includes analyzing the enhanced image of the hard mask with a second machine learning model to determine whether the target layer has defects.

Find Patent Forward Citations

Yang, Chih-Kai. (2026). Defect inspection system employing an image enhancing model and a defect detection model, and method of using the same (U.S. Patent No. 12707940). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12707940

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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