The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2026

Filed:

Jul. 07, 2023
Applicant:

Invention and Collaboration Laboratory Pte. Ltd., Singapore, SG;

Inventors:

Chao-Chun Lu, Hsinchu, TW;

Li-Ping Huang, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 30/60 (2025.01); H10D 62/10 (2025.01); H10D 84/84 (2025.01);
U.S. Cl.
CPC ...
H10D 30/601 (2025.01); H10D 62/116 (2025.01); H10D 84/84 (2025.01);
Abstract

A transistor structure includes a semiconductor substrate, a gate region, a first trench, a first isolation region and a first conductive region. The semiconductor substrate is with an original semiconductor surface. The gate region is over the semiconductor surface. The first trench is formed below the original semiconductor surface. The first isolation region is in the first trench. The first conductive region is formed with a first doping region and a second doping region; wherein the first doping region is within the semiconductor substrate and the second doping region is formed outside from the semiconductor substrate.


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