The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2026
Filed:
Nov. 15, 2022
Kla Corporation, Milpitas, CA (US);
Mordechy Kot, Migdal Haemek, IL;
KLA Corporation, Milpitas, CA (US);
Abstract
A metrology system may receive metrology data for a first set of overlay targets including at least two cells with different intended offsets. The system may further receive metrology data for a second set of overlay targets, where the metrology data for the second set of overlay targets is based on fewer cells than for the first set of overlay targets. The system may further generate sensitivity metrics at locations of the first set of overlay targets based on the metrology data for the first set of overlay targets, generate overlay measurements for the first set of overlay targets based on the sensitivity metrics and the metrology data from the first set of overlay targets, and generate overlay measurements for the first and second sets of overlay targets based on the sensitivity metrics and the metrology data from the second set of overlay targets.