The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Mar. 18, 2022
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Heng Wu, Santa Clara, CA (US);
Julien Frougier, Albany, NY (US);
Ruilong Xie, Niskayuna, NY (US);
Chen Zhang, Guilderland, NY (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 30/67 (2025.01); H10D 30/01 (2025.01);
U.S. Cl.
CPC ...
H10D 30/6728 (2025.01); H10D 30/031 (2025.01); H10D 30/0318 (2025.01); H10D 30/6713 (2025.01); H10D 30/6729 (2025.01);
Abstract
A semiconductor structure including a bottom source drain region arranged above front-end-of-line circuitry, a gate region disposed above and insulated from the bottom source drain region, a top source drain region disposed above and insulated from the gate region, and a channel region adjacent to the gate region and extending vertically from a top surface of the bottom source drain region to a bottom surface of the top source drain region.