The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Aug. 04, 2020
Lam Research Corporation, Fremont, CA (US);
Christopher Kimball, San Jose, CA (US);
Hema Swaroop Mopidevi, Fremont, CA (US);
Saravanapriyan Sriraman, Fremont, CA (US);
Tom A. Kamp, San Jose, CA (US);
Darrell Ehrlich, San Jose, CA (US);
Anthony Contreras, Stockton, CA (US);
Chiara Helena Catherina Giammanco Macpherson, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
An edge ring for a plasma processing system includes a first annular body configured to surround a substrate support during plasma processing, an upper surface, a lower surface, a radially inner surface, a radially outer surface, and N spacers arranged in N spaced locations on the radially outer surface of the edge ring to reduce variations in a predetermined gap between the first annular body of the edge ring and a structure separate from the edge ring as the edge ring is heated and cooled during plasma processing.