The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Aug. 20, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Wei Fang, Milpitas, CA (US);
Lingling Pu, San Jose, CA (US);
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/265 (2013.01); H01J 37/28 (2013.01); H01J 2237/24514 (2013.01); H01J 2237/24592 (2013.01); H01J 2237/282 (2013.01);
Abstract
Systems and methods for image enhancement are disclosed. A method for enhancing an image may include receiving records of a performance metric for beams of the multi-beam system in an imaging process, each record associated with a beam. The method may also include determining whether an abnormality of a beam occurs based on a baseline value determined using a portion of the records. The method may further include providing an abnormality indication in response to the determination that the abnormality has occurred.