The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2026
Filed:
Dec. 30, 2022
Fei Company, Hillsboro, OR (US);
Jing Wang, Lake Oswego, OR (US);
Chad Rue, North Plains, OR (US);
Aurelien Philippe Jean Maclou Botman, Hillsboro, OR (US);
FEI Company, Hillsboro, OR (US);
Abstract
Methods include arranging a substrate in a vacuum chamber of a charged particle beam microscope, wherein the substrate is held at a cryogenic temperature, and depositing on the substrate at the cryogenic temperature a condensate precursor that is stored in a crucible, wherein the deposited condensate precursor forms a deposition layer on the substrate. An apparatus include a vacuum chamber configured to support a substrate, a condensate precursor system coupled to the vacuum chamber, wherein a vacuum pump is configured to draw a vacuum on a storage reservoir to reduce a vapor pressure build-up of a one or more volatile contaminants in the storage reservoir and thereby reduce a deposition of the one or more contaminants on the substrate during the condensing of the condensate precursor on the substrate. A condensate precursor can comprise a transition metal center comprising hafnium or osmium. Related deposition and cap layers are disclosed.