The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2026

Filed:

Jan. 10, 2024
Applicant:

Globalfoundries U.s. Inc., Malta, NY (US);

Inventors:

Alexander Derrickson, Saratoga Springs, NY (US);

Halid Mulaosmanovic, Dresden, DE;

Peter Baars, Dresden, DE;

Judson R. Holt, Ballston Lake, NY (US);

Zhixing Zhao, Dresden, DE;

Assignee:

GlobalFoundries U.S. Inc., Malta, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H10D 10/01 (2025.01); H10D 10/80 (2025.01);
U.S. Cl.
CPC ...
H10D 10/021 (2025.01); H10D 10/821 (2025.01);
Abstract

Structures for a heterojunction bipolar transistor and methods of forming a structure for a heterojunction bipolar transistor. The structure comprises a first semiconductor layer including a first portion, a second portion, and a third portion between the first portion and the second portion, a first terminal including a first semiconductor region on the first portion of the first semiconductor layer, a second terminal including a second semiconductor region on the second portion of the first semiconductor layer, an intrinsic base laterally disposed between the first terminal and the second terminal, and an extrinsic base on the intrinsic base. The intrinsic base includes a doped region in the third portion of the first semiconductor layer, and the doped region has a dopant depth profile with a dopant concentration that is asymmetrical relative to the first terminal and the second terminal.


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