The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Oct. 14, 2022
Applicant:
United Microelectronics Corp., Hsin-Chu City, TW;
Inventor:
PO-Yu Yang, Hsinchu City, TW;
Assignee:
UNITED MICROELECTRONICS CORP., Hsin-Chu City, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 30/47 (2025.01); H10D 30/01 (2025.01); H10D 64/27 (2025.01);
U.S. Cl.
CPC ...
H10D 30/015 (2025.01); H10D 30/475 (2025.01); H10D 64/411 (2025.01);
Abstract
A high electron mobility transistor (HEMT) includes a substrate, a channel layer on the substrate, a barrier layer on the channel layer, a gate structure on the barrier layer, a gate spacer on the gate structure, and a gate contact on the gate spacer. The gate contact includes a first portion and a second portion respectively at two sides of the gate spacer and directly contacting the gate structure.
Yang, PO-Yu. (2026). High electron mobility transistor and method for forming the same (U.S. Patent No. 12684796). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12684796
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile