The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

Nov. 02, 2023
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Benedikt Stoib, Feldkirchen-Westerham, DE;

Hans-Joachim Schulze, Taufkirchen, DE;

Marten Müller, Schliersee, DE;

Daniel Schlögl, Villach, AT;

Moriz Jelinek, Villach, AT;

Holger Schulze, Villach, AT;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10D 8/01 (2025.01); H10D 8/00 (2025.01); H10D 62/10 (2025.01);
U.S. Cl.
CPC ...
H10D 8/045 (2025.01); H10D 8/411 (2025.01); H10D 62/105 (2025.01);
Abstract

A semiconductor device includes a semiconductor body having first and second opposite surfaces along a vertical direction, and an active diode area. The active diode area includes: a p-doped anode region adjoining the first surface; an n-doped drift region between the anode region and the second surface; an n-doped cathode contact region adjoining the second surface; a p-doped injection region adjoining the second surface and the cathode contact region; and a p-doped auxiliary region between the drift region and the cathode contact region. The auxiliary region includes first and second sub-regions. In a top view, the first sub-region covers at least part of the injection region and the second sub-region covers at least part of the cathode contact region. In the top view, the auxiliary region includes a plurality of openings covering from 0.1% to an 20% of a surface area of the active diode area at the second surface.


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