The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2026
Filed:
Aug. 16, 2024
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Ranjit Rohidas Borude, Hachioji, JP;
Annisa Noorhidayati, Tama, JP;
Agung Setiadi, Kokubunji, JP;
Hideaki Fukuda, Hachioji, JP;
Makoto Igarashi, Fuchu, JP;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/52 (2006.01); C23C 16/34 (2006.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01); H01J 37/32 (2006.01); H10P 14/60 (2026.01); H10P 14/694 (2026.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/345 (2013.01); C23C 16/45553 (2013.01); C23C 16/56 (2013.01); H01J 37/32449 (2013.01); H01J 37/32899 (2013.01); H10P 14/6336 (2026.01); H10P 14/6339 (2026.01); H10P 14/6532 (2026.01); H10P 14/6538 (2026.01); H10P 14/69433 (2026.01); H10P 72/0436 (2026.01); H01J 2237/3341 (2013.01); H01J 2237/3346 (2013.01);
Abstract
A method and system for depositing silicon using a multiple-chamber reactor are disclosed. An exemplary method includes performing one or more deposition cycles and performing a treatment, etch and/or cure process.